The 26th International Display Workshops (IDW '19)

Presentation information

Oral Presentation

[AMD5] Oxide TFT: Device Fundamentals

Fri. Nov 29, 2019 9:00 AM - 10:30 AM Mid-sized Hall B (1F)

Chair: Kazumasa Nomoto (Sony)
Co-Chair: Hideya Kumomi (Tokyo Tech.)

10:10 AM - 10:30 AM

[AMD5-4] Simulation Study of Self-Heating and Edge Effects on Oxide-Semiconductor TFTs: Channel-Width Dependence

*Katsumi Abe1, Kazuki Ota1, Takeshi Kuwagaki1 (1. Silvaco Japan Co., Ltd. (Japan))

Keywords:Oxide-semiconductor, Thin-film transistor, Self-heating, Edge effect, Device simulation

We studied the channel-width dependence of oxide-semiconductor TFTs via a device simulator. The results show that the ON-current is affected by two factors: self-heating and edge effects. The former increases the current with a rise in temperature, while the latter produces the high edge current-density caused by its strong electric-field.