The 26th International Display Workshops (IDW '19)

講演情報

Oral Presentation

[FMC2] Metrology and Manufacturing

2019年11月27日(水) 15:20 〜 16:40 Room 108 (1F)

Chair: K Käläntär (Global Optical Solutions)
Co-Chair: Toshiaki Nonaka (Merck Performance Materials)

16:00 〜 16:20

[FMC2-3] Researches of Process Reduction for Viewing Angle Controllable LCD

*Shih-Bin Liu1, Lujie Wang1, Jun Jiang1, Yanbing Qiao1, Chia-Te Liao1, Te-Chen Chung1 (1. InfoVision Optoelectronics (Kunshan) Co., Ltd. (China))

キーワード:mask reduction, half-tone mask, product process, LCD

In this paper, a better condition is found to maintain the thickness of PR for half-tone technology, and some issues of process reduction in B-ITO and M3 layers are solved. These issues of topology for M3 after ashing and last wet etching are still being studied.