[FMCp3] Metrology & Manufacturing

[FMCp3-6] High Resolution Technologies of 1.0 µm L/S Using PSM Specialized in DUV Broadband Illumination

*Kanji Suzuki¹, Manabu Hakko¹, Miwako Ando¹, Koichi Takasaki¹, Nobuhiko Yabu¹, Kouhei Nagano¹, Nozomu Izumi¹ (1. Canon Inc. (Japan))

キーワード：Lithography, FPD, High resolution, DUV, Phase shift mask

To meet the demands for high resolution, we designed a PSM specialized in DUV broadband illumination and evaluated resolution performance with the PSM. In this paper, we present the ability of 1.0 μm L/S pattern resolution with our PSM based on simulation results and exposure test results.