The 26th International Display Workshops (IDW '19)

講演情報

Poster Presentation

[FMCp3] Metrology & Manufacturing

2019年11月28日(木) 10:40 〜 13:10 Main Hall (1F)

10:40 〜 13:10

[FMCp3-6] High Resolution Technologies of 1.0 µm L/S Using PSM Specialized in DUV Broadband Illumination

*Kanji Suzuki1, Manabu Hakko1, Miwako Ando1, Koichi Takasaki1, Nobuhiko Yabu1, Kouhei Nagano1, Nozomu Izumi1 (1. Canon Inc. (Japan))

キーワード:Lithography, FPD, High resolution, DUV, Phase shift mask

To meet the demands for high resolution, we designed a PSM specialized in DUV broadband illumination and evaluated resolution performance with the PSM. In this paper, we present the ability of 1.0 μm L/S pattern resolution with our PSM based on simulation results and exposure test results.