16:20 〜 16:40
[OLED2-4] Ellipsometry, XRR, and GCIB-TOF-SIMS Analysis of Small Molecule Layers in Solution Process and Vacuum Deposition Process
キーワード:solution process, deposition process, organic light emitting diodes, time-of-flight secondary ion mass spectrometry, gas cluster ion beam
Ellipsometry, XRR, and GCIB-TOF-SIMS are applied to investigation of the spin-coating process as comparison of spin-coated samples and vacuum evaporated samples. The residual solvent of spin-coating process was observed in spin-coated samples by GCIB-TOF-SIMS. The result suggested that it can cause the decrease of refractive index observed in ellipsometry.