Poster Session P3

[P3-03] Comprehensive characterization of Al₂O₃/SiO_x/Si passivation layer for photovoltaics using nondestructive XPS and HAXPES techniques coupled with sputter technique

*Pei-Chen Huang^1,2,3, Ting-Jia Yang², Man-Ying Wang^1,2,3, Jing-Jong Shyue^1,3, Wei-Chun Lin² (1. Department of Materials Science and Engineering, National Taiwan University, Taipei, Taiwan., 2. Department of Photonics, National Sun Yat-sen University, Kaohsiung, Taiwan., 3. Research Center for Applied Sciences, Academia Sinica, Taipei, Taiwan.)