[P4-01] On the connection between the self-sputter yield and deposition rate in high power impulse magnetron sputtering
*Jon Tomas Gudmundsson1,2, Kateryna Barynova1, Swetha Suresh Babu1, Martin Rudolph3, Joel Fischer4, Michael A Raadu2, Nils Brenning2,4, Daniel Lundin4(1. University of Iceland, 2. KTH Royal Institute of Technology, 3. Leibniz Institute of Surface Engineering (IOM), 4. Linköping University)