Poster Session P4

[P4-15] Microstructure and Mechanical Properties of CrTiAlN Coatings Deposited by DC Pulse Magnetron Sputtering Assisted by Changing the Power Output of Different Cr Targets Through High Power Impulse Magnetron Sputtering

*Fu-Sen Yang^1,2, Yu-Lin Kuo¹, Jian-Fu Tang⁴, Tzu-Yu Hung³, Yu-Lin Zhang³, Chi-Lung Chang^2,3 (1. Department of Mechanical Engineering, National Taiwan University of Science and Technology, Taiwan, ROC, 2. Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, Taiwan, ROC, 3. Department of Materials Engineering, Ming Chi University of Technology, Taiwan, ROC, 4. Department of Electronic Engineering, Lunghwa University of Science and Technology, Taiwan, ROC)