Oral Session SP2

[SP2-04] Low temperature growth of highly crystallized AlN by using microwave plasma assisted HiPIMS at very low N2 flow rates

*Yuji Oshida¹, Thomas Nelis^2,3, Caroline Hain^2,3, Tetsuhide Shimizu¹ (1. Tokyo Metropolitan University, 2. Institute for Applied Laser, Photonics and Surface Technologies, BFH, Bern University of Applied Sciences, Quellgasse 21, 2502 Biel/Bienne, Switzerland, 3. Laboratory for Mechanics of Materials and Nanostructures, Empa, Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, 3602 Thun, Switzerland)