*Martin Dienwiebel (Karlsruhe Institute of Technology KIT and Fraunhofer IWM, Germany)

*Naruo Sasaki (The University of Electro-Communications, Japan)

*Chen Xiao^1,2, Bart Weber^1,2, Steve Franklin^1,3 (1. Advanced Research Center for Nanolithography, Netherlands, 2. Van der Waals-Zeeman Institute, Institute of Physics, University of Amsterdam, Science Park 904, 1098XH, Amsterdam, Netherlands, 3. Department of Materials Science and Engineering, The University of Sheffield, Sheffield, S1 3JD, UK)

*Shinji Yamada (Kao Corporation, Japan)

*Kenji Fukuzawa, Yuxi Song (Nagoya University, Japan)

Kerstin Falk^1,2, Andrea Codrignani¹, Daniele Savio³, Lars Pastewka⁴, *Michael Moseler^1,2,4 (1. Fraunhofer IWM, Germany, 2. Microtribology Center μTC, Germany, 3. Freudenberg Technology Innovation SE & Co.KG, Germany, 4. University of Freiburg, Germany)

*Hiroshi Matsukawa (Aoyama Gakuin University, Japan)

*Koji Miyake (National Institute of Advanced Industrial Science and Technology, Japan)

*Anderson Dalavale Kaiser Pinto, Denis Mazuyer, Juliette Cayer-Barrioz (LTDS, Ecole Centrale de Lyon, CNRS UMR5513, France)

*TAKUMI SATO, Ikki Yasuda, Yusei Kobayashi, Noriyoshi Arai, Kenji Yasuoka (Keio University, Japan)