[Mon-PO1D-1] Nanostructured VO₂ fabricated by V thin film deposition and oxidation

*Kazutaka Nishikawa¹, Masamichi Yoshimura¹, Yoshihide Watanabe¹ (1. Toyota Technological Institute (Japan))

[Mon-PO1D-2] Demonstration of operation of resistive switching device using
oxide film transferred from Ga-In-Sn

*Meguru Nagai¹, Naoki Maeda¹, Shinichi Yamamoto¹ (1. Ryukoku Univ. (Japan))

[Mon-PO1D-3] Award Applied
Construction of Structure-Controlled Perovskite Ultra-thin Layers on Single-Crystal Substrate via Self-Assembled Monolayer

*Mami Takahari¹, Hiyori Adachi¹, Yuri Kameoka¹, Toshihiro Kondo¹ (1. Ochanomizu University (Japan))

[Mon-PO1D-4] moved to online session
Fabrication of a ZnO-based piezoelectric nanogenerator device via hot water oxidation

*Lance Tristan Oliver Roncal Pengson¹, Christian Laurence Aquino³, Rafael Pangilinan², Maria Theresa Maria Theresa ², Magdaleno Jr. Vasquez ¹ (1. Department of Mining, Metallurgical, and Materials Engineering, College of Engineering, University of the Philippines (Philippines), 2. Electrical and Electronics Engineering Institute, College of Engineering, University of the Philippines (Philippines), 3. Department of Engineering Science, College of Engineering and Agro-Industrial Technology, University of the Philippines (Philippines))

[Mon-PO1D-5] Award Applied
Controlled Doping into Diamond-like Carbon by Photoemission-Assisted Townsend Discharge Plasma

*Hisashi Koga¹, Ryuta Tsukazaki¹, Susumu Takabayashi¹ (1. National Institute of Technology, Ariake College (Japan))

[Mon-PO1D-6] Preparation and characterization of black Al films

Yoshiki Maekawa¹, *Midori Kawamura¹, Takayuki Kiba¹, Yoshio Abe¹, Mikito Ueda², Martin Hruska³, Jan Kejzlar³, Premysl Fitl³, Michal Novotný³ (1. Kitami Inst Tech (Japan), 2. Hokkaido University (Japan), 3. UCT Prague (Czech Republic))

[Mon-PO1D-7] Relationship between droplet density and internal stress in CrN films deposited by AIP method

*Kazuya Kusaka¹, Morio Kawasaki¹, Daisuke Yonekura¹ (1. Tokushima University (Japan))

[Mon-PO1D-8] Formation of Thick DLC Films Using Gas-Jet Plasma CVD Method with Ar/C₂H₂ Mixed Gas

*Toru Harigai¹, Hikaru Ohhra¹, Takahiro Bando¹, Hirofumi Takikawa¹, Shinsuke Kunitsugu², Hidenobu Gonda³ (1. Toyohashi University of Technology (Japan), 2. Industrial Technology Center of Okayama Prefecture (Japan), 3. OSG Coating Service Co. Ltd. (Japan))

[Mon-PO1D-9] Award Applied
Covalent Organic Framework Films Synthesized by Alternating
Deposition Polymerization: Structure and CO₂/N₂ Separation
Mechanism Analysis

*Masaki Kato¹, Takashi Yanase², Seiya Yokokura³, Taro Nagahama³, Toshihiro Shimada³ (1. Grad school. chem sci & eng., Hokkaido Univ. (Japan), 2. Fac. sci., Toho Univ. (Japan), 3. Fac. Eng., Hokkaido Univ. (Japan))

[Mon-PO1D-10] Epitaxial growth of deep UV-transparent and conductive Sn_1−xGe_xO₂ thin films doped with Ta

*Tetsuya Hasegawa^1,2, Yo Nagashima¹, Michitaka Fukumoto¹, Masato Tsuchii¹, Yuki Sugisawa³, Daiichiro Sekiba³, Yasushi Hirose^1,4 (1. Univ. of Tokyo (Japan), 2. Ochanomizu Univ. (Japan), 3. Univ. of Tsukuba (Japan), 4. Tokyo Metropolitan Univ. (Japan))

[Mon-PO1D-11] Preparation of magnetic thin film by dc magnetron sputtering

*Ryosuke Hirai¹, Norimichi Watanabe¹, Susumu Abe¹, Akiyoshi Nakayama¹ (1. Kanagawa University (Japan))

[Mon-PO1D-12] Generation and evaluation of boron mixed carbon thin films by vacuum arc deposition

*Taichi Ishida¹, Kunpei Sato¹, Masayuki Yoshimoto², Michikazu Kinsho², Motoi Wada¹ (1. Graduate School of Science and Engineering, Doshisha University (Japan), 2. J-PARC Center (Japan Atomic Energy Agency) (Japan))

[Mon-PO1D-13] Fabrication of Nitrogen-doped TiO₂ thin films for photovoltaic applications

*MELANIE MAGDARAOG MARTINEZ¹, MAGDALENO R. VASQUEZ¹ (1. UNIVERSITY OF THE PHILIPPINES (Philippines))

[Mon-PO1D-14] Thin film formation of Al₂O₃ by atomically precise deposition using a digitally processed DC reactive sputtering system (DPDRS)

*Shinichiro Saisho^1,2 (1. SHINCRON CO.,LTD (Japan), 2. The University of Electro-Communications (Japan))

セッション情報

[Mon-PO1D] Poster Session (17:30-19:00) Category D