[Tue-E2] ISSP / Surface Engineering

2022年9月13日(火) 15:00 〜 16:30 Room E (Meeting Room 107+108)

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15:00 〜 15:45

[Tue-E2-1K] Industrial Applications and Future of High Power Impulse Magnetron Sputtering

*Arutiun P. Ehiasarian¹, Papken Eh. Hovsepian¹ (1. Sheffield Hallam University (UK))

15:45 〜 16:00

[Tue-E2-2] Using positivity to your advantage – Bipolar HiPIMS discharges and their application for plasma cleaning and coating

*Dermot Patrick Monaghan¹, Patrick McCarthy¹, Tommaso Sgrilli¹, Alex Azzopardi¹, Victor Bellido¹, Ivan Fernandez², Jose Antonio Santiago², Ambiorn Wennberg² (1. Gencoa Ltd (UK), 2. Nano 4 Energy (Spain))

16:00 〜 16:15

[Tue-E2-3] On the growth of Ti and Al films on inner wall of millimeter-sized hole by high-power impulse magnetron sputtering

*Hidetoshi Komiya¹, Yoshikazu Teranishi², Ming Yang¹, Tetsuhide Shimizu¹ (1. Tokyo Metro. Univ. (Japan), 2. Tokyo Metro. Ind. Tech. Res. Inst. (Japan))

16:15 〜 16:30

[Tue-E2-4] Precise phase control of vanadium oxide thin films using peak current regulated reactive HiPIMS

Naoto Saito¹, Grégory Savorianakis², Ming Yang¹, Stephanos Konstantinidis², *Tetsuhide Shimizu¹ (1. Tokyo Metropolitan University (Japan), 2. University of Mons (Belgium))

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