[Tue-H2] Plasma Science and Technologies

Tue. Sep 13, 2022 3:00 PM - 4:45 PM Room H (Meeting Room 204)

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3:00 PM - 3:30 PM

[Tue-H2-1I] Multiscale evolution of monolayer graphene following low-energy ion beam irradiations

*Pierre Vinchon¹, Sjoerd Roorda¹, Francois Schiettekatte¹, Luc Stafford¹ (1. Universite de Montreal (Canada))

3:30 PM - 3:45 PM

[Tue-H2-2] Atomic Layer Etching of Si by fluorine radicals with Ar plasmas - Molecular Dynamics Simulation Study

Erin Joy Capdos Tinacba¹, *Satoshi Hamaguchi¹ (1. Osaka University (Japan))

3:45 PM - 4:00 PM

[Tue-H2-3] Award Applied
IR Spectroscopic Study of Film Deposition Process during Acetylene Plasma

*Tatsuo Nakai¹, Atsuya Kuwada¹, Ryo Sasamoto¹, Masanori Shinohara², Takashi Matsumoto³, Satoshi Tanaka³ (1. Graduate School of Engineering, Fukuoka University (Japan), 2. Department of Electrical Engineering, Fukuoka University (Japan), 3. Tokyo Electron Technology Solutions Limited (Japan))

4:00 PM - 4:15 PM

[Tue-H2-4] Impact of amplitude modulated discharge on suppression of nanoparticle growth in TEOS/O₂/Ar capacitively coupled plasma

*Kunihiro KAMATAKI¹, Akihiro Yamamoto¹, Iori Nagao¹, Yuma Yamamoto¹, Daisuke Yamashita¹, Takamasa Okumura¹, Naoto Yamashita¹, Naho Itagaki¹, Kazunori Koga^1,2, Masaharu Shiratani¹ (1. Kyushu University (Japan), 2. NINS (Japan))

4:15 PM - 4:30 PM

[Tue-H2-5] Award Applied
Effect of positive bias potential on synthesis and transport of tin nanoparticles using magnetron sputtering

*Murugesh Munaswamy¹, Koichi Sasaki¹ (1. Hokkaido University (Japan))

4:30 PM - 4:45 PM

[Tue-H2-6] HMDSO treatment of coconut fibers by AC-powered plasma

*Kenneth Rullan Duque¹, Arantxa Danielle Montallana^1,2, Lance Tristan Oliver Pengson¹, Magdaleno Jr. Vasquez¹ (1. Department of Mining, Metallurgical, and Materials Engineering, College of Engineering, University of the Philippines (Philippines), 2. The Graduate School of Engineering, Doshisha University (Japan))

Session information

[Tue-H2] Plasma Science and Technologies

[Tue-H2-1I] Multiscale evolution of monolayer graphene following low-energy ion beam irradiations

[Tue-H2-2] Atomic Layer Etching of Si by fluorine radicals with Ar plasmas - Molecular Dynamics Simulation Study

[Tue-H2-3] Award Applied
IR Spectroscopic Study of Film Deposition Process during Acetylene Plasma

[Tue-H2-4] Impact of amplitude modulated discharge on suppression of nanoparticle growth in TEOS/O₂/Ar capacitively coupled plasma

[Tue-H2-5] Award Applied
Effect of positive bias potential on synthesis and transport of tin nanoparticles using magnetron sputtering

[Tue-H2-6] HMDSO treatment of coconut fibers by AC-powered plasma

Authentication

Session information

[Tue-H2] Plasma Science and Technologies

[Tue-H2-1I] Multiscale evolution of monolayer graphene following low-energy ion beam irradiations

[Tue-H2-2] Atomic Layer Etching of Si by fluorine radicals with Ar plasmas - Molecular Dynamics Simulation Study

[Tue-H2-3] Award Applied IR Spectroscopic Study of Film Deposition Process during Acetylene Plasma

[Tue-H2-4] Impact of amplitude modulated discharge on suppression of nanoparticle growth in TEOS/O2/Ar capacitively coupled plasma

[Tue-H2-5] Award Applied Effect of positive bias potential on synthesis and transport of tin nanoparticles using magnetron sputtering

[Tue-H2-6] HMDSO treatment of coconut fibers by AC-powered plasma

Authentication

[Tue-H2-3] Award Applied
IR Spectroscopic Study of Film Deposition Process during Acetylene Plasma

[Tue-H2-4] Impact of amplitude modulated discharge on suppression of nanoparticle growth in TEOS/O₂/Ar capacitively coupled plasma

[Tue-H2-5] Award Applied
Effect of positive bias potential on synthesis and transport of tin nanoparticles using magnetron sputtering