[Tue-H2] Plasma Science and Technologies

2022年9月13日(火) 15:00 〜 16:45 Room H (Meeting Room 204)

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15:00 〜 15:30

[Tue-H2-1I] Multiscale evolution of monolayer graphene following low-energy ion beam irradiations

*Pierre Vinchon¹, Sjoerd Roorda¹, Francois Schiettekatte¹, Luc Stafford¹ (1. Universite de Montreal (Canada))

15:30 〜 15:45

[Tue-H2-2] Atomic Layer Etching of Si by fluorine radicals with Ar plasmas - Molecular Dynamics Simulation Study

Erin Joy Capdos Tinacba¹, *Satoshi Hamaguchi¹ (1. Osaka University (Japan))

15:45 〜 16:00

[Tue-H2-3] Award Applied
IR Spectroscopic Study of Film Deposition Process during Acetylene Plasma

*Tatsuo Nakai¹, Atsuya Kuwada¹, Ryo Sasamoto¹, Masanori Shinohara², Takashi Matsumoto³, Satoshi Tanaka³ (1. Graduate School of Engineering, Fukuoka University (Japan), 2. Department of Electrical Engineering, Fukuoka University (Japan), 3. Tokyo Electron Technology Solutions Limited (Japan))

16:00 〜 16:15

[Tue-H2-4] Impact of amplitude modulated discharge on suppression of nanoparticle growth in TEOS/O₂/Ar capacitively coupled plasma

*Kunihiro KAMATAKI¹, Akihiro Yamamoto¹, Iori Nagao¹, Yuma Yamamoto¹, Daisuke Yamashita¹, Takamasa Okumura¹, Naoto Yamashita¹, Naho Itagaki¹, Kazunori Koga^1,2, Masaharu Shiratani¹ (1. Kyushu University (Japan), 2. NINS (Japan))

16:15 〜 16:30

[Tue-H2-5] Award Applied
Effect of positive bias potential on synthesis and transport of tin nanoparticles using magnetron sputtering

*Murugesh Munaswamy¹, Koichi Sasaki¹ (1. Hokkaido University (Japan))

16:30 〜 16:45

[Tue-H2-6] HMDSO treatment of coconut fibers by AC-powered plasma

*Kenneth Rullan Duque¹, Arantxa Danielle Montallana^1,2, Lance Tristan Oliver Pengson¹, Magdaleno Jr. Vasquez¹ (1. Department of Mining, Metallurgical, and Materials Engineering, College of Engineering, University of the Philippines (Philippines), 2. The Graduate School of Engineering, Doshisha University (Japan))

セッション情報

[Tue-H2] Plasma Science and Technologies

[Tue-H2-1I] Multiscale evolution of monolayer graphene following low-energy ion beam irradiations

[Tue-H2-2] Atomic Layer Etching of Si by fluorine radicals with Ar plasmas - Molecular Dynamics Simulation Study

[Tue-H2-3] Award Applied
IR Spectroscopic Study of Film Deposition Process during Acetylene Plasma

[Tue-H2-4] Impact of amplitude modulated discharge on suppression of nanoparticle growth in TEOS/O₂/Ar capacitively coupled plasma

[Tue-H2-5] Award Applied
Effect of positive bias potential on synthesis and transport of tin nanoparticles using magnetron sputtering

[Tue-H2-6] HMDSO treatment of coconut fibers by AC-powered plasma

認証

セッション情報

[Tue-H2] Plasma Science and Technologies

[Tue-H2-1I] Multiscale evolution of monolayer graphene following low-energy ion beam irradiations

[Tue-H2-2] Atomic Layer Etching of Si by fluorine radicals with Ar plasmas - Molecular Dynamics Simulation Study

[Tue-H2-3] Award Applied IR Spectroscopic Study of Film Deposition Process during Acetylene Plasma

[Tue-H2-4] Impact of amplitude modulated discharge on suppression of nanoparticle growth in TEOS/O2/Ar capacitively coupled plasma

[Tue-H2-5] Award Applied Effect of positive bias potential on synthesis and transport of tin nanoparticles using magnetron sputtering

[Tue-H2-6] HMDSO treatment of coconut fibers by AC-powered plasma

認証

[Tue-H2-3] Award Applied
IR Spectroscopic Study of Film Deposition Process during Acetylene Plasma

[Tue-H2-4] Impact of amplitude modulated discharge on suppression of nanoparticle growth in TEOS/O₂/Ar capacitively coupled plasma

[Tue-H2-5] Award Applied
Effect of positive bias potential on synthesis and transport of tin nanoparticles using magnetron sputtering