[Mon-G2] Thin Film

[Mon-G2-6] Crystal structure and electronic property modification of layered calcium ruthenium oxyfluoride thin films

*Akira Chikamatsu¹, Shota Fukuma², Tsukasa Katayama^3,4, Takahiro Maruyama², Keiichi Yanagisawa⁵, Koji Kimoto⁵, Miho Kitamura⁶, Koji Horiba⁷, Hiroshi Kumigashira⁸, Yasushi Hirose², Tetsuya Hasegawa² (1. Ochanomizu University (Japan), 2. The University of Tokyo (Japan), 3. Hokkaido University (Japan), 4. JST PRESTO (Japan), 5. NIMS (Japan), 6. KEK (Japan), 7. QST (Japan), 8. Tohoku University (Japan))

Keywords:Topochemical reaction, Calcium ruthenium oxyfluoride, Pulsed-laser deposition