IVC-22

Presentation information

Print

Parallel Sessions

Plasma Science and Technologies

[Mon-H1] Plasma Science and Technologies

Mon. Sep 12, 2022 1:15 PM - 3:15 PM Room H (Meeting Room 204)

1:15 PM - 1:45 PM

[Mon-H1-1I] Latest Understanding of rf-driven Electronegative Plasma Source

*Toshiaki Makabe1 (1. Keio University (Japan))

Keywords:Electronegative plasma, capacitively coupled plasma, dry plasma etching, plasma modeling, diagnostics by emission CT

Please log in with your participant account.
» Participant Log In