[Mon-H1] Plasma Science and Technologies

[Mon-H1-4] Modeling of high power impulse magnetron sputtering (HiPIMS) discharges with graphite target

*Jon Tomas Gudmundsson^1,2, Henrik Eliasson³, Martin Rudolph⁴, Kateryna Barynova¹, Nils Brenning^2,3, Michael A. Raadu², Hamidreza Hajihoseini⁵, Daniel Lundin³ (1. University of Iceland (Iceland), 2. KTH Royal Institute of Technology (Sweden), 3. Linköping University (Sweden), 4. Leibniz Institute of Surface Engineering (IOM) (Germany), 5. University of Twente (Netherlands))

キーワード：high power impulse magnetron sputtering (HiPIMS), magnetron sputtering, carbon, DLC