[Mon-PO1A] Poster Session (17:30-19:00) Category A

[Mon-PO1A-7] Award Applied
Control of Radical/Ion Flux Ratio of Reactive Ion Beam Etching (RIBE) using Dual Exhaust system

*YunJong Jang¹, DooSan Kim¹, HongSeong Gil¹, HaeIn Kwon¹, GeunYoung Yeom^1,2 (1. School of Advanced Materials Science and Engineering, Sungkyunkwan Universtiy (Korea), 2. SKKU Advanced Institute of Nano Technology (SAINT), Sungkyunkwan Universtiy (Korea))

キーワード：Reactive Ion Etching (RIE), Reactive Ion Beam Etching (RIBE), Plasma, Radical, Etch Profile