[Mon-PO1A] Poster Session (17:30-19:00) Category A

[Mon-PO1A-7] Award Applied
Control of Radical/Ion Flux Ratio of Reactive Ion Beam Etching (RIBE) using Dual Exhaust system

*YunJong Jang¹, DooSan Kim¹, HongSeong Gil¹, HaeIn Kwon¹, GeunYoung Yeom^1,2 (1. School of Advanced Materials Science and Engineering, Sungkyunkwan Universtiy (Korea), 2. SKKU Advanced Institute of Nano Technology (SAINT), Sungkyunkwan Universtiy (Korea))

Keywords:Reactive Ion Etching (RIE), Reactive Ion Beam Etching (RIBE), Plasma, Radical, Etch Profile