[Mon-PO1A] Poster Session (17:30-19:00) Category A

[Mon-PO1A-22] Characteristics of incident particle flux determining growth rates and electrical properties of indium tin oxide films deposited by ion-plating with dc arc discharge

*Hisashi Kitami^1,2, Toshiyuki Sakemi¹, Tetsuya Yamamoto² (1. Sumitomo Heavy Industries, Ltd. (Japan), 2. Research Institute, Kochi Univ. of Technology (Japan))

キーワード：Plasma diagnostics, Ion-plating, Direct current arc plasma, Transparent conductive oxide, Oxide semiconductor, Indium tin oxide