[Mon-PO1D] Poster Session (17:30-19:00) Category D

[Mon-PO1D-8] Formation of Thick DLC Films Using Gas-Jet Plasma CVD Method with Ar/C₂H₂ Mixed Gas

*Toru Harigai¹, Hikaru Ohhra¹, Takahiro Bando¹, Hirofumi Takikawa¹, Shinsuke Kunitsugu², Hidenobu Gonda³ (1. Toyohashi University of Technology (Japan), 2. Industrial Technology Center of Okayama Prefecture (Japan), 3. OSG Coating Service Co. Ltd. (Japan))

キーワード：High deposition rate, Diamond-like carbon, Amorphous carbon, Plasma CVD