IVC-22

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Poster Session

Poster Session (17:30-19:00)

[Mon-PO1D] Poster Session (17:30-19:00) Category D

Mon. Sep 12, 2022 5:30 PM - 7:00 PM Poster D (Main Hall)

[Mon-PO1D-14] Thin film formation of Al2O3 by atomically precise deposition using a digitally processed DC reactive sputtering system (DPDRS)

*Shinichiro Saisho1,2 (1. SHINCRON CO.,LTD (Japan), 2. The University of Electro-Communications (Japan))

Keywords:Reactive Sputtering, Atomically precise deposition, Al2O3

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