[Thu-H2] ISSP / Surface Engineering

[Thu-H2-1I] Patterning and nanostructuration of plasma thin films grown under acoustic wave activation

*Manuel Oliva Ramirez^1,2, Ana Gomez-Ramirez^1,2, Aurelio Garcia-Valenzuela², Armaghan Fakhfouri³, Victor Rico-Gavira², Teresa Cristina Rojas², Rafael Alvarez², Siegfried B. Menzel³, Alberto Palmero², Andreas Winkler³, Agustín R. Gonzalez-Elipe² (1. Departamento de Fisica Atomica, Molecular y Nuclear, Universidad de Sevilla, Avda. Reina Mercedes, 41012 Seville, Spain. (Spain), 2. Instituto de Ciencia de Materiales de Sevilla (CSIC-Univ. Sevilla), Avda. Americo Vespucio 49, 41092 Sevilla, Spain. (Spain), 3. IFW Dresden, SAWLab Saxony, Helmholtzstr. 20, 01069 Dresden, Germany. (Germany))

キーワード：plasma, thin films, patterning, magnetron sputtering