[Tue-C2] Scanning Probe Microscopy

[Tue-C2-3] Dual Bias Modulation Electrostatic Force Microscopy on n-type Si/Si Junctions Fabricated by Surface-activated Bonding

*Daichi Kobayashi¹, Naoteru Shigekawa³, Jianbo Liang³, Takuji Takahashi^1,2 (1. Institute of Industrial Science, The University of Tokyo (Japan), 2. Institute for Nano Quantum Information Electronics, The University of Tokyo (Japan), 3. Graduate School of Engineering, Osaka Metropolitan University (Japan))

キーワード：Scanning probe microscopy, Electrostatic force microscopy, Surface-activated bonding