IVC-22

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Parallel Sessions

ISSP / Surface Engineering

[Tue-E2] ISSP / Surface Engineering

Tue. Sep 13, 2022 3:00 PM - 4:30 PM Room E (Meeting Room 107+108)

4:15 PM - 4:30 PM

[Tue-E2-4] Precise phase control of vanadium oxide thin films using peak current regulated reactive HiPIMS

Naoto Saito1, Grégory Savorianakis2, Ming Yang1, Stephanos Konstantinidis2, *Tetsuhide Shimizu1 (1. Tokyo Metropolitan University (Japan), 2. University of Mons (Belgium))

Keywords:Reactive sputtering, HiPIMS, VO2, Peak current

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