[Tue-E2] ISSP / Surface Engineering

[Tue-E2-4] Precise phase control of vanadium oxide thin films using peak current regulated reactive HiPIMS

Naoto Saito¹, Grégory Savorianakis², Ming Yang¹, Stephanos Konstantinidis², *Tetsuhide Shimizu¹ (1. Tokyo Metropolitan University (Japan), 2. University of Mons (Belgium))

キーワード：Reactive sputtering, HiPIMS, VO2, Peak current