[Tue-F2] Joint session of Advanced light spectroscopy and Surface Science

[Tue-F2-1] Role of molecularly-adsorbed O₂ on oxidation at SiO₂/Si(001) interface

*Yasutaka Tsuda¹, Akitaka Yoshigoe¹, Shuichi Ogawa², Tetsuya Sakamoto¹, Yuji Takakuwa² (1. Japan Atomic Energy Agency (Japan), 2. Tohoku University (Japan))

Keywords:silicon, oxidation, surface, interface