IVC-22

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Parallel Sessions

Plasma Science and Technologies

[Tue-H1] Plasma Science and Technologies

Tue. Sep 13, 2022 12:30 PM - 1:45 PM Room H (Meeting Room 204)

1:00 PM - 1:45 PM

[Tue-H1-6K] Control of charged particle dynamics for process optimization in technological high frequency plasmas

*Julian Schulze1 (1. Ruhr-University Bochum (Germany))

Keywords:Technological high frequency plasmas, Charged particle power absorption, Plasma surface interactions, Control of distribution functions

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