[Tue-H2] Plasma Science and Technologies

[Tue-H2-3] Award Applied
IR Spectroscopic Study of Film Deposition Process during Acetylene Plasma

*Tatsuo Nakai¹, Atsuya Kuwada¹, Ryo Sasamoto¹, Masanori Shinohara², Takashi Matsumoto³, Satoshi Tanaka³ (1. Graduate School of Engineering, Fukuoka University (Japan), 2. Department of Electrical Engineering, Fukuoka University (Japan), 3. Tokyo Electron Technology Solutions Limited (Japan))

キーワード：Acetylene Plasma, Deposition, FT-IR