IVC-22

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Parallel Sessions

Plasma Science and Technologies

[Tue-H2] Plasma Science and Technologies

Tue. Sep 13, 2022 3:00 PM - 4:45 PM Room H (Meeting Room 204)

4:15 PM - 4:30 PM

[Tue-H2-5] Award Applied
Effect of positive bias potential on synthesis and transport of tin nanoparticles using magnetron sputtering

*Murugesh Munaswamy1, Koichi Sasaki1 (1. Hokkaido University (Japan))

Keywords:argon, plasma, nanoparticles, magnetron sputtering

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