[Tue-H2] Plasma Science and Technologies

[Tue-H2-5] Award Applied
Effect of positive bias potential on synthesis and transport of tin nanoparticles using magnetron sputtering

*Murugesh Munaswamy¹, Koichi Sasaki¹ (1. Hokkaido University (Japan))

キーワード：argon, plasma, nanoparticles, magnetron sputtering