[Tue-I1] Data-driven materials science and process informatics

[Tue-I1-2] Sensitivity Enhancement of Optical Signals for Plasma Etching Endpoint Detection with Clustering Analysis

*Seonghyeon Lee¹, Hojun Choi¹, Jaehyeon Kim¹, Heeyeop Chae^1,2 (1. Sungkyunkwan University (SKKU) (Korea), 2. SKKU Advanced Institute of Nanotechnology (SAINT) (Korea))

Keywords:Endpoint detection, Plasma etching, Optical emission spectroscopy (OES), Machine learning