[Tue-PO1D] Poster Session (17:00-18:30) Category D

[Tue-PO1D-6] Excellent compositional controllability of HZO films using time resolved Programmable Radical-Assisted Sputtering

*Kazuhiro Sato¹, Yohei Sakano¹, Yasuhito Tanaka¹, Shinichiro Saisho¹, Takuya Sugawara¹ (1. Shincron Co., Ltd. (Japan))

Keywords:sputtering, multilayer, RAS, Hafnium Zirconium Oxide, pulse DC