IVC-22

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Poster Session

Poster Session (17:00-18:30)

[Tue-PO1D] Poster Session (17:00-18:30) Category D

Tue. Sep 13, 2022 5:00 PM - 6:30 PM Poster D (Main Hall)

[Tue-PO1D-8] Low-temperature Deposited SiOx Film for 3D-LSI

*Masaru Sato1, Kota Niide1, Yuki Kawai1, Mayumi B. Takeyama1 (1. Kitami Institute of Technology (Japan))

Keywords:SiOx Film, Low Temperature, 3D-LSI

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