[Tue-PO1D] Poster Session (17:00-18:30) Category D

[Tue-PO1D-8] Low-temperature Deposited SiO_x Film for 3D-LSI

*Masaru Sato¹, Kota Niide¹, Yuki Kawai¹, Mayumi B. Takeyama¹ (1. Kitami Institute of Technology (Japan))

キーワード：SiOx Film, Low Temperature, 3D-LSI