[Wed-E2] Nanometer Structures

[Wed-E2-2] Photoelectron spectroscopy of artificially designed three-dimensional Si structures with {111} facet surfaces

*Ken Hattori¹, Liliany N. Pamasi¹, Aydar Irmikimov¹, Takaaki Higashi¹, HaoBang Yang¹, Yuya Sakai¹, Tomoya Shimizu¹, Yuki Ida¹, Wataru Imayama¹, Juharni Juharni¹, Ai I. Osaka², Hidekazu Tanaka², XiaoQian Shi³, FangZhun Guo³, Takuji Iimori⁴, Fumio Komori⁴, Shigemasa Suga², Kiyohisa Tanaka⁵, Shin-ichiro Tanaka², Azusa N. Hattori² (1. Nara Institute of Science and Technology (Japan), 2. Osaka University (Japan), 3. Dalian Jiaotong University (China), 4. The University of Tokyo (Japan), 5. Institute for Molecular Science (Japan))

Keywords:three-dimensional Si structure surfaces, lithography, angle-resolved photoelectron spectroscopy (ARPES), low-energy electron diffraction (LEED), reciprocal space mapping (RSM)