[Wed-G1] Thin Film

[Wed-G1-5] Preparation of SiCO Film by Reactive RF-UBMS with Oxygen

*Takahiro Bando¹, Hayato Sakai¹, Toru Harigai¹, Hirofumi Takikawa¹ (1. Toyohashi University of Technology (Japan))

キーワード：Silicon oxycarbide, Reactive magnetron sputtering, X-ray diffractometer, X-ray photoelectron spectrometer, Annealing