IVC-22

Presentation information

Parallel Sessions

Thin Film

[Wed-G1] Thin Film

Wed. Sep 14, 2022 2:00 PM - 4:00 PM Room G (Small Hall)

3:15 PM - 3:30 PM

[Wed-G1-7] Reactive sputter deposition of β-Ni(OH)2 thin films using H2O as a reactive gas and substrate cooling to −80 °C

*Yoshio Abe1, Masaki Kataoka1, Yuki Yokoiwa1, Midori Kawamura1, Kyung Ho Kim1, Takayuki Kiba1 (1. Kitami Inst. Technol. (Japan))

Keywords:reactive sputtering, nickel hydroxide thin film, electrochromic smart window, substrate cooling, aging effect

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