[Wed-H1] ISSP / Surface Engineering

[Wed-H1-3] The Role of Reactive Gas Pulsing Synchronized with Digitally Processed DC Sputtering

*Hideo Isshiki¹, Yasuhito Tanaka^1,2, Shinichiro Saisho^1,2 (1. The University of Electro-Communications (Japan), 2. Shincron Co., LTD. (Japan))

Keywords:digitally processed DC sputtering, atomically precise deposition, metal oxide layered crystals, rare earth crystalline compounds