[Wed-PO1D] Poster Session (12:30-14:00) Category D

[Wed-PO1D-5] Titanium oxide films containing nitrogen fabricated by plasma-assisted deposition using nitrogen monoxide gas

*Takahisa ICHINOHE¹, Hideki OHNO¹ (1. National Institute of Technology, Tokyo College (Japan))

Keywords:titanium oxide containing nitrogen, plasma-assisted deposition, multi-capillary