20120 Fall Annual(167th) Meeting

Presentation information

一般講演

9.Electric/Electronic/Optical Materials » Magnetic Materials

[G] Spintronics/Nanomagnetic Materials

Thu. Sep 17, 2020 1:00 PM - 2:50 PM Rm. I (ZoomRm.I)

Chair:Yasushi Endo(Tohoku University) Sub Chairman (assistant):

2:05 PM - 2:20 PM

[68] Fabricating L10-FeNi films with a large degree of order and uniaxial magnetic anisotropy by denitriding method

*Keita ITO1,2, Masahiro HAYASHIDA3, Takumi ICHIMURA3, Takahiro NISHIO4, Syo GOTO4, Hiroaki KURA4, Tomoyuki KOGANEZAWA5, Masaki MIZUGUCHI6, Yusuke SHIMADA1, Toyohiko KONNO1, Hideto YANAGIHARA7, Koki TAKANASHI1,2,8 (1. IMR, Tohoku Univ., 2. CSRN, Tohoku Univ., 3. Grad. Sch. Eng., Tohoku Univ., 4. DENSO CORPORATION, 5. JASRI, 6. Nagoya Univ., 7. Univ. of Tsukuba, 8. CSIS, Tohoku Univ.)

Keywords:L10-FeNi、脱窒素

分子線エピタキシー法によりエピタキシャルFeNiN薄膜を作製し、H2ガス雰囲気中で脱窒素熱処理を行うことで、エピタキシャルL10-FeNi薄膜の作製と高い規則度および高い一軸磁気異方性エネルギーを実現した。

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