[S3] S3.エネルギー関連材料の特性評価・解析・予測(II)

[S3.23] Thermoelectric Performance of W-substituted Fe2VAl Thin Films Deposited on n-Si wafers

*Fahmi Machda^1,2,3, Kentaro Kuga^1,2,3, Saurabh Singh^1,2,3, Masaharu Matsunami^1,2,3, Tsunehiro Takeuchi^1,2,3 (1. Energy Materials Laboratory, Toyota Technological Institute, Nagoya 464-8603, JAPAN、2. Research Center for Smart Energy Technology, Toyota Technological Institute, Nagoya 464-8603, JAPAN、3. JST-CREST, Tokyo 102-8666, JAPAN)

キーワード：Thermoelectric、Heusler Alloy、Thin film、Sputtering

We are trying to investigate the key factors leading to the high thermoelectric performance of the Fe2VAl-based Heusler alloy synthesized on n-Si substrates by RF magnetron sputtering.