公益社団法人日本補綴歯科学会第133回学術大会 / The 14th Biennial Congress of the Asian Academy of Prosthodontics (AAP)

講演情報

HIRANUMA AWARD/Member country/area speakers session

現地発表

HIRANUMA AWARD/Member country/area speakers session 1

2024年7月6日(土) 09:00 〜 09:45 第5会場 (幕張メッセ国際会議場 3F 303)

座長:Amarsaikhan Bazar(Mongolian National University)、CHEW Chong Lin(National University)

[HIRANUMA-2] Bond strength of radio frequency argon plasma - Treated Yttrium- Tetragonal Zirconia Polycrystal (Y-TZP) with hydrofluoric acid at different etching time

*Menandro Santos Sumang1 (1. Philippine Prosthodontics Society)

[Abstract]
This study aimed to assess the effect on bond strength of RF argon plasma treated Y-TZP and 10-MDP based resin cement with HF acid at different etching time. 40 sintered tetragonal zirconia block samples positioned arbitrarily at the center of the acrylic block were subjected to different surface treatments: (1) RF argon plasma treatment; (2) RF argon plasma treatment with HF etching time for 4, 8 and 12 hours. Surface conditioning with Monobond N containing 10-MDP was applied in all groups. Multilink Automix was bonded into the zirconia surface specimens. All groups were subjected to thermocycling. SBS testing was performed using a UTM, and failure modes were assessed using Stereomicroscopy. The SBS results were analyzed statistically using inferential analysis like one-way ANOVA. K-S for 2 samples to assess if there is significant difference between the plasma group (control) and the plasma treated with HF (group B). The highest SBS values with HF acid etching were observed with 12 hours etching time that were treated with RF argon plasma treatment combined with Hf acid etching followed by the control group which is the RF argon plasma treatment alone. The lowest SBS were observed in group B and C which are the 4 and 8 hours Hf acid etching time combined with RF argon plasma treatment. The SBS between RF argon plasma treated zirconia and 10-MDP based composite resin cement was improved using HF acid at different etching time but the result was not significant.

トピックス
●RF argon plasma treatment
●HF acid etching
●SBS