[29a-B9-1~12] 8.1 Plasma production and control

Fri. Mar 29, 2013 9:00 AM - 12:15 PM B9 (K2 4F-1407)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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[29a-B9-1] Influence of water temperature on atmospheric discharge using water-dielectric multi-layer electrode

^○Tatsuya Misawa¹, Takayuki Ayabe¹, Yuusuke Akiyoshi¹ (Saga Univ.¹)

[29a-B9-2] Rise in Water Temperature Induced by Ion Irradiation from Plasma

^○Yudai Minagawa¹, Naoki Shirai¹, Satoshi Uchida¹, Fumiyoshi Tochikubo¹ (Tokyo Metro. Univ.¹)

[29a-B9-3] Study on Water Treatment by Bubbling of Plasma Radical Flows

^○Hiroyuki Yoshiki¹, Kouhei Sato¹ (Tsuruoka Natl. College of Tech.¹)

[29a-B9-4] △Breakdown behavior in helium fluids including in the vicinity of the critical point

^○（D）Hitoshi Muneoka¹, Keiichiro Urabe¹, Sven Stauss¹, Kazuo Terashima¹ (Univ. Tokyo¹)

[29a-B9-5] Influence of Supplied Gas into the Plasma Jet Generator on Sterilization

^○Toshiyuki Kawasaki¹, Kyosuke Sato¹, Hisashi Morisaki¹, Hiroshi Baba¹, Shoichi Umeda¹, Miho Sakai¹, Giichiro Uchida², Kazunori Koga², Masaharu Shiratani² (Nippon Bunri Univ.¹, Kyusyu Univ.²)

[29a-B9-6] High density narrow tube ozonizer by increased barrier discharge frequency

Junji Tsujino¹, ^○Takeshi Kitajima¹, Toshiki Nakano¹ (Nat. Def. Acad.¹)

[29a-B9-6.1] Break(15min)

[29a-B9-7] Low-Pressure Microwave-Plasma Production without Magnetic Field and Its Application

^○Tomonori Noda¹, Masato Nakabo¹, Hirotaka Toyoda^1,2 (Nagoya Univ.¹, PLANT Nagoya Univ.²)

[29a-B9-8] Bifurcation phenomena of microwave plasma generation in negative permeability space

^○Yoshihiro Nakamura¹, Osamu Sakai¹ (Kyoto Univ.¹)

[29a-B9-9] △Measurement of basic characteristics in the 2nd stage plasma of tandem type ECRIS

^○（M1）Keisuke Yano¹, Dai Nozaki¹, Yosuke Kurisu¹, Daiju Kimura¹, Noriyuki Kawashima², Sho Kumakura², Fuminobu Sato¹, Yushi Kato¹, Toshiyuki Iida¹ (Osaka Univ.¹, Osaka Univ.²)

[29a-B9-10] △Dependence of Magnetic Field Strength around the Mirror Bottom on Beam Current from the 2nd Stage of the Tandem Type ECRIS

^○（M2）Dai Nozaki¹, Yosuke Kurisu¹, Keisuke Yano¹, Daiju Kimura¹, Noriyuki Kawashima², Sho Kumakura², Fuminobu Sato¹, Yushi Kato¹, Toshiyuki Iida¹ (Osaka Univ.¹, Osaka Univ.²)

[29a-B9-11] △Enhancement of the ECR Efficiency Exciting Selective Microwave Mode in a Large Bore ECRIS with Permanent Comb Shaped Magnet

^○（M2）Yosuke Kurisu¹, Dai Nozaki¹, Keisuke Yano¹, Daiju Kimura¹, Sho Kumakura², Noriyuki Kawashima², Fuminobu Sato¹, Yushi Kato¹, Toshiyuki Iida¹ (Osaka Univ.¹, Osaka Univ.²)

[29a-B9-12] Effect of applying negative DC bias voltage to cathode for RF magnetron sputter

^○Kouhei Osuga¹, Toshinori Yamada², Haruo Shindo², Masao Isomura^1,2 (Tokai Univ.¹, Tokai Univ.²)

Session information

[29a-B9-1~12] 8.1 Plasma production and control