[29p-B2-1~18] 7.6 Ion beams

Fri. Mar 29, 2013 1:30 PM - 6:15 PM B2 (K2 3F-1302)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

+Add all to schedule

[29p-B2-0] Lunch(90min)

[29p-B2-1] Characteristics of electron beam ion source

^○Makoto Sakurai¹, Shogo Sakai¹, Shunsuke Ohtani², Hiroyuki Sakaue³ (Kobe Univ.¹, Univ. Electrocomm.², Nat. Inst. Fusion Sci.³)

[29p-B2-2] Effect of Emitter Shape on Electrospray in Vacuum

^○Satoshi Ninomiya¹, Lee Chuin Chen¹, Yuji Sakai², Kenzo Hiraoka² (Univ. of Yamanashi, Medicine and Engineering¹, Univ. of Yamanashi, CERC²)

[29p-B2-3] Development of cluster ion source for high spatial resolution SIMS

^○Sota Torii¹, Toshio Seki^1,2, Takaaki Aoki^1,2, jiro Matsuo^1,2 (Kyoto Univ.¹, JST-CREST²)

[29p-B2-4] Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS) Using an Ionic-liquid Primary Ion Beam Source

^○Yukio Fujiwara¹, Naoki Saito¹, Hidehiko Nonaka¹, Shingo Ichimura¹ (AIST¹)

[29p-B2-5] Time Resolution of Single-Event Three Dimensional TOF-RBS (II)

^○Yasuhisa Hamada¹, Satoshi Abo¹, Albert Seidl^1,2, Fujio Wakaya¹, Mikio Takai¹ (CQSTEC, Osaka Univ.¹, Magdeburg-Stendal Univ. of Appl. Sci.²)

[29p-B2-6] The Application and High-Speed of Imaging Mass Spectrometry with Swift Heavy Ion

^○Sho Shitomoto¹, Toshio Seki^1,2, Takaaki Aoki^1,2, Jiro Matsuo^1,2 (Kyoto Univ.¹, JST-CREST²)

[29p-B2-7] Depth profiling of polyester/melamine resin by secondary ion mass spectrometry with Ar gas cluster ion beam

^○Suguru Nishinomiya¹, Kunihiko Toshin¹, Kensuke Iuchi², Naoki Se², Kousuke Moritani², Kozo Mochiji² (Nippon Steel & Sumitomo Metal Corporation¹, University of Hyogo²)

[29p-B2-8] Soft-sputtering of insulin film with noble gases and methane gas cluster ion beams

^○（M1）Masanori Kanai¹, Kousuke Moritani¹, issei Ihara¹, kosuke Goto¹, Norio Inui¹, Kozo Mochiji¹ (Univ. of Hyogo¹)

[29p-B2-9] Metallic particle formation by proton irradiation in liquid

^○Tomohiro Kobayashi¹, Tokihiro Ikeda¹, Kiyoshi Ogiwara¹, Yasunori Yamazaki¹, Teruyuki Hakoda², Tetsuya Yamaki² (RIKEN¹, JAEA²)

[29p-B2-9.1] Break(15min)

[29p-B2-10] △Magnetic Property of the CoFe Film With Gas Cluster Ion Beam

^○（M1）Akihiro Fujimoto¹, Asahi Kimura¹, Noriaki Toyoda¹, Isao Yamada¹ (Hyogo Univ.¹)

[29p-B2-11] △Evaluation of surface condition of MRAM material after gas cluster ion beam etching

^○Ryo Hinoura¹, Akira Yamaguchi¹, Noriaki Toyoda¹, Kenichi Hara², Isao Yamada¹ (Hyougo univ.¹, Tokyo Electron²)

[29p-B2-12] △Planarization of films under MTJ with GCIB irradiation

^○Akira Yamaguchi¹, Ryo Hinoura¹, Noriaki Toyoda¹, Ken-ichi Hara², Isao Yamada¹ (Graduate school of engineering, Univ. of Hyogo¹, Tokyo Electron²)

[29p-B2-13] High-speed Reactive Etching with ClF3 Neutral Cluster Beam

^○Toshio Seki¹, Yu Yoshino², Takehiko Senoo², Kunihiko Koike², Takaaki Aoki¹, Jiro Matsuo¹ (Kyoto Univ.¹, Iwatani Corp.²)

[29p-B2-14] Room-temperature Fabrication of Nanostructures on Transparent and Flexible Polymer Substrates and the Dependence of Ion Incidence Angle

^○Takuto Noda¹, Pradip Ghosh¹, Munisamy Subramanian¹, Debasish Ghosh¹, Hiroaki Nakamori¹, Takuma Tsuchiya¹, Kuniyoshi Okabe¹, Kalita Golap¹, Masaki Tanemura¹ (Nagoya Inst. Technol.¹)

[29p-B2-15] Aspect ratio controlled fabrication of ripple structures on transparent and flexible substrates by ion irradiation method

^○Kuniyoshi Okabe¹, Hiroaki Nakamori¹, Tomoharu Tanase¹, Takuma Tsuchiya¹, Takuto Noda¹, Golap Kalita¹, Masaki Tanemura¹ (Nagoya Inst. Technol.¹)

[29p-B2-16] △c-axis parallel polarization inverted AlN multilayer structure by ion beam assisted deposition

^○（D）Masashi Suzuki¹, Takahiko Yanigitani¹ (Nagoya Inst. of Tech.¹)

[29p-B2-17] Irradiation effects on the fabrication of highly-oriented β-FeSi₂ thin film using an ion beam

^○satoshi hamamoto^1,2, kenji yamaguchi², kiichi hojo² (Ibaraki Univ.¹, Japan Atomic Energy Agency²)

[29p-B2-18] Thermal Stability of Platinum Cluster Disk Constructed on Silicon Surface

^○Nobuyuki Fukui¹, Hisato Yasumatsu² (Genesis. Res . Inst., Inc.¹, Toyota. Tech. Inst.²)

Session information

[29p-B2-1~18] 7.6 Ion beams