[27p-A7-1~17] 8.3 Plasma deposition of thin film and surface treatment

[27p-A7-4] Prediction of growth rate of single-crystal diamond by using plasma CVD

^○Hideaki Yamada¹, Akiyoshi Chayahara¹, Yoshiaki Mokuno¹, Nobuteru Tsubouchi¹, Shin-ichi Shikata¹ (DRL, AIST¹)

Keywords:単結晶ダイヤモンドウェハ、マイクロ波プラズマCVD、シミュレーション