[27p-PA4-1~17] 8. Plasma Electronics

[27p-PA4-2] Effect of rate gas mixing on fullerene plasmas in ECR ion source (8.1)

Toyohisa Asaji¹, ^○Tsuneyuki Ohba¹, Takashi Uchida², Hidekazu Minezaki², Kosuke Oshima², Masayuki Muramatsu³, Biri Sandor⁴, Atushi Kitagawa³, Yushi Kato⁵, Yoshikazu Yoshida² (Oshima College¹, Toyo Univ², NIRS³, ATOMKI⁴, Osaka Univ⁵)

Keywords:電子サイクロトロン共鳴イオン源