[28a-F2-1~11] 6.3 Oxide-based electronics

[28a-F2-6] △Growth and properties of NdNiO₂ epitaxial thin films

^○Tomoya Onozuka¹, Akira Chikamatsu^1,2, Tsukasa Katayama¹, Kei Shigematsu¹, Tomoteru Fukumura^1,2, Tetsuya Hasegawa^1,2,3 (Univ. of Tokyo¹, JST-CREST², KAST³)

Keywords:ニッケル酸化物薄膜、パルスレーザー堆積法、トポタクティック還元