[28a-G6-1~11] 13.5 Si process technology

[28a-G6-8] Local Transfer of Phosphorus-Doped Silicon Layer and Simultaneous Dopant Activation Induced by Near-Infrared Semiconductor Diode Laser Irradiation

^○（M2）Yoshitaka Kobayashi¹, Kouhei Sakaike¹, Shogo Nakamura¹, Muneki Akazawa¹, Seiichiro Higashi¹ (Hiroshima Univ.¹)

Keywords:転写