[28p-G6-1~17] 13.5 Si process technology

[28p-G6-12] Control of Crystalline Position Using a-Si strips and Slit Masks during High Speed Lateral Crystallization Induced by Micro-Thermal-Plasma-Jet Irradiation

^○Yuji Fujita¹, Shohei Hayashi¹, Seiji Morisaki¹, Takahiro Kamikura¹, Shogo Yamamoto¹, Seiichiro Higashi¹ (Hiroshima Univ.¹)

Keywords:結晶化、マイクロ熱プラズマジェット、Siスリットマスク