[28p-G8-1~14] 13.2 Semiconductor surfaces

[28p-G8-12] △Study of the decomposition mechanism of the PMMA-type polymers by the hydrogen radical generated using Hot-wire catalyzer Ⅱ

^○Yusuke Noto¹, Yu Arai¹, Seiji Takahashi¹, Akihiko Kono¹, Kenji Ishikawa², Masaru Hori², Hideo Horibe¹ (Kanazawa Inst. Technol.¹, Nagoya Univ.²)

Keywords:水素ラジカル、レジスト用ベースポリマー、還元分解除去